Silicon Wafer Epitaxial Processing Services
Substrate Diameter: 2", 3", 4", 6", 8", 12"
Deposition process: LPCVD, PECVD, Sputtering, MOVCD
Thin Film Layers: Pt, Ti, AL, Au, Cr, Si, SiO2, Si3N4, Polycrystalline silicon, etc.
Substrates: silicon wafers, sapphire wafers
|
