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Saniwave Technology Co., Ltd.
Website: www.saniwaveltd.com
Tel: +86-755-89216755
Fax: +86-755-89264521
E-mail:  info@saniwaveltd.com
Address: 601, Building T, Hengyu Science 
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Longgang District, Shenzhen, China

Sputtering Targets
 Product >> Sputtering Targets >> All categories
 
Number:
615154812
Name:
Rotating Silicon Sputtering Targets
Specifications:
Remarks:
Category:
Sputtering Targets
 
   Product description
The rotating silicon sputtering target is either polycrystalline or monocrystalline, with a silicon content of 99.9999% (6N) or higher, and a relative density of not less than 99.5% (calculated based on a theoretical density of 2.33 g/cm³). The density uniformity deviation should not exceed ±0.2%, and the resistivity range is 0.005 Ω·cm to 0.05 Ω·cm (can be adjusted according to customer requirements).

The rotating silicon sputtering target surface is free of cracks and chipping, and has a uniform color. The target interior is free of inclusions and contaminants, and the pore diameter is not greater than 0.1 mm.

The dimensional quality is as follows: roundness tolerance is ±0.1 mm, coaxiality tolerance is ±0.1 mm, or can be processed according to customer requirements and technical drawings.

Standard specifications: diameter 120-300 mm, length per piece not exceeding 1500 mm; custom processing is available upon request.
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